Enhanced glow discharge plasma immersion ion implantation does not require an external plasma source but ion focusing affects the lateral ion fluence uniformity, thereby hampering its use in high-fluence hydrogen ion implantation for thin film transfer and fabrication of silicon-on-insulator. Insertion of a metal ring between the sample stage and glass chamber improves the ion uniformity and reduces the ion fluence non-uniformity as the cathode voltage is raised. Two-dimensional multiple-grid particle-in-cell simulation confirms that the variation of electric field inside the chamber leads to mitigation of the ion focusing phenomenon and the results are corroborated experimentally by hydrogen forward scattering.

Filtered cathode vacuum arc deposition can remove the macroparticles produced from the cathode. Positively biasing the whole filter or inserting a biased plate in the filter can increase the plasma transport efficiency. We developed a curved magnetic filter with rectangular cross-section to improve the coating efficiency. In this study, the effect of biased plates at outer-wall and inner-wall on the transport efficiency of vacuum arc plasma through rectangular curved magnetic filter was investigated. A Langmuir probe system is used to measure the distribution properties of the filtered plasma at 15 places in the outlet plane of the filter. The results showed that a positively biased plate at innerwall would increase the output ion current density and make the plasma concentrate to the middle of the outlet plane.