No abstract

No abstract

No abstract

Projection lenses for high resolution lithography have high NA and work at small wavelengths. In the wavelength regime of VUV (e.g. 193nm), there is a very limited number of optical glasses available, namely fused silica and calcium fluoride. The latter is very expensive and used only sparely, leading to limited possibilities for chromatic correction. In addition to catadioptric approaches, another way to deal with chromatic aberrations is the use of diffractive optical elements (DOEs). They have negative dispersion coupled with positive power and they do not contribute to the Petzval sum. Moreover, it is easy to integrate an aspherical functionality into the structure of the DOE. Usually a DOE is placed close to the aperture stop to correct axial color. The stop of a lithographic projection lens often is located at the largest diameter, causing some serious fabrication difficulties for the DOE. For this reason a class of lenses with intermediate image is of interest. Here, the accessible conjugate of the aperture stop enhances the possibilities to arrange the stop and the DOE. This allows a convenient tradeoff between fabrication challenges and aberration correcting properties. We present different lens designs that take advantage of the named properties of DOEs at high numerical aperture.

To enable optical lithography for sub 55 nm features, ArF immersion lithography requires numerical apertures to be significantly larger than 1 -thus leading to new challenges for optical design. Refractive lens designs are not capable to capture these extreme etendues. Catadioptric lens designs can overcome these fundamental issues by keeping the diameters of the optical materials acceptable. We have studied various catadioptric design approaches. The main criteria used to evaluate the potential of the different solutions include mechanical complexity, reticle compatibility, optical sensitivities, polarization capabilities, image field shape, as well as enabling extendibility to even higher NAs. Our assessment leads us to a new design type called catadioptric in-line design which shows superior performance for high NA systems with NA > 1.1.