A method based on continuously modulating the vapor deposition angle, , in the range from 00 < < 1800 at an appropriate rate is proposed, by which the typical colunmar structure of vapordeposited thin films can be prevented in favor of a more compact structure, similar to a bulk material. The growth rates of such films are quantifed, and the their microstructure is simulated by computer. At the same time, an experimental study has been performed successfully. Lastly, the mechanism underlying these improved properties is analyzed and discussed.

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