Periodically inserting energetic relaxations into Reverse Monte Carlo fits improves the accuracy of model structures with minimal additional computational cost.

Understanding the atomic structure of ultrathin (<20 nm) atomic layer deposition (ALD) coatings is critical to establish structure−property relationships and accelerate the application of ALD films to stabilize battery interfaces. Previous studies have measured the atomic structure of nanoscale ALD films using cryogenic electron diffraction with a large (∼200 nm) beam diameter. However, for ultrathin ALD coatings, these measurements provide only ensemble average structural information and cannot be used to directly measure differences in atomic structure through the depth of the ALD film. In this study, we localize the electron beam to a small (∼5 nm) spot size using cryogenic scanning transmission electron microscope (STEM), and we collect electron diffraction data at multiple points along the depth of a 12 nm thick ALD AlO x film deposited onto a carbon nanotube (CNT) substrate without a contribution from the substrate. We couple these diffraction measurements with pair distribution function (PDF) analysis and iterative reverse Monte Carlo-molecular statics (RMC-MS) modeling to compare atomic structure metrics at different positions in the film depth. We interpret the modeling results considering the three-dimensional (3D) concentric cylindrical sample geometry of a CNT with uniform AlO x coating. These measurements confirm a two-phase bulk/interface structural model proposed previously for ALD AlO x and indicate that the interfacial layer at the CNT−AlO x interface is 2.5 nm thick�5 times larger than previously reported. This report demonstrates direct measurement of atomic structural variations across nanoscale material interfaces that is of broad interest for electrochemical applications and will help inform the use of ALD coatings to stabilize lithium-ion battery interfaces.

To accelerate technological innovations using atomic layer deposition (ALD) coatings, we need to establish better understanding of structure-property relationships for ALD films. Historically, the ALD community has had difficulty connecting the atomic structure of ALD films with their performance, largely because of the significant challenge in determining the atomic-scale structure of ultrathin ALD films that are often amorphous, polycrystalline, or defective. In this work, we describe a series of recent efforts that collectively aim to improve understanding of the atomic structure of ALD coatings and inform structure-property understanding. These efforts employ experimental measurements including (a) inert-transfer XPS, (b) in-situ synchrotron high energy X-ray diffraction, and (c) cryogenic electron diffraction. Of particular focus in this talk is the use of X-ray and electron diffraction measurements in combination with pair distribution function (PDF) analysis and reverse Monte Carlo (RMC) structural modeling. We describe a newly developed approach employing alternating RMC and molecular statics steps (RMC-MS) that improves the physical accuracy of model structures derived from experimental diffraction data with minimal additional computational cost over conventional RMC modeling. We also describe efforts using localized cryogenic electron diffraction and PDF analysis (cryo-ePDF) with a ≤ 5 nm spot size to measure atomic structure at ALD interfaces. Together, these advances allow us to quantify differences in the atomic structure as a function of position through the depth of ALD films. A simple two-phase model comprised of bulk and interfacial layers with distinct atomic structure features is consistent with our measurements for both aluminum oxide and zinc oxide ALD coatings. The approaches we report yield atomic structure models that can be used to inform computational studies of the properties if ALD films and will aid in the selection and modification of ALD coating chemistries to address technological needs.