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TiN hard coatings deposited on highspeed steel substrates by reactive direct current magnetron sputtering J. Vac. Sci. Technol. A 5, 2180 (1987 10.1116/1.574949 Morphology and properties of sputtered HfN layers as a function of substrate temperature and sputtering atmosphere J.(Ti,AI)N layers were prepared by reactive dc and radio-frequency (rf) magnetron sputtering onto polished flat high speed steel (HSS) surfaces. The rectangular samples were mounted on a special sample holder providing a temperature gradient in the range of 500 °C to room temperature along the length of the sample. The (Ti,Al)N layers were deposited at various N2 and Ar pressures. The target was a Ti-50 at. % Al alloy. The film morphology and composition was observed by scanning electron microscopy (SEM) and Auger electron spectroscopy (AES), respectively, and correlated to mechanical properties like hardness and critical load (scratch test). The results are discussed with the respect of the sputtering conditions.