Photolysis of
CpRu(CO)2SiMe2SiMe3
(1a) with a low- or medium-pressure Hg lamp for
a
long time caused the loss of a SiMe2 moiety to give
CpRu(CO)2SiMe3 (2), perhaps
through
the photochemical dissociation of a CO ligand. This mechanism was
supported by the
quantitative formation of the bis(silylene)ruthenium complex
Cp(OC)Ru{SiMe2···O(Me)···
SiMe2} (3a) by photolysis of the
(methoxydisilanyl)ruthenium complex
CpRu(CO)2SiMe2SiMe2OMe (1b). The X-ray crystal
structure analysis of 3a revealed that 3a has an
almost
planar Ru−Si−O−Si four-membered chelate ring with short Ru−Si
bonds (2.316(3) and
2.311(3) Å) and long Si···O bonds (1.801(7) and
1.793(7) Å). 3a reacts with MeOH
instantaneously to give
Cp(OC)Ru(H)(SiMe2OMe)2
(4) quantitatively. Photolysis of CpM(CO)2SiMe2SiMe2OMe
(1b, M = Ru; 1c, M = Fe) or
Cp(OC)M{SiMe2···O(Me)···SiMe2}
(3a,
M = Ru; 3b, M = Fe) with the photochemical silylene
precursor (SiMe2)6 by means of a
low-pressure Hg lamp afforded a mixture of 3a or
3b, disilanyl−silylene complexes Cp(OC)M{SiMe2←O(Me)SiMe2SiMe2}
(5a, M = Ru; 5b, M = Fe), and
(SiMe2)5. Two possible
mechanisms for the addition of dimethylsilylene to 3 to give
5 were proposed.
Photolysis of the 3-methoxytrisilanyl complex
CpM(CO)2SiMe2SiMe2SiMe2OMe
(1a, M =
Ru; 1b, M = Fe) afforded the intramolecularly
methoxy-stabilized disilanyl−silylene complex
Cp(OC)M{SiMe2←O(Me)SiMe2SiMe2}
(2a, M = Ru; 2b, M = Fe) as a primary
product.
Prolonged irradiation of the solution resulted in the decay of
2a,b with release of a
dimethylsilylene moiety to give the methoxy-bridged bis(silylene)
complex Cp(OC)M{SiMe2···O(Me)···SiMe2}
(3a, M = Ru; 3b, M = Fe). The X-ray
crystal structure analysis of
2a revealed that 2a has a five-membered chelate
ring and the Ru−Si(silylene) bond (2.291(2) Å) is much shorter than the other Ru−Si bond (2.350(1) Å).
It can be concluded from
the bond lengths that the former possesses a partial double-bond
character while the latter
is a normal Ru−Si single bond. Photolysis of diisopropyl
derivatives
CpM(CO)2SiMe2Si
i
Pr2SiMe2OMe (4a, M = Ru; 4b, M =
Fe) gave
Cp(OC)M{SiMe2←O(Me)SiMe2Si
i
Pr2}
(5a, M =
Ru; 5b, M = Fe) exclusively, in which the positions of
substituents on silicon atoms in 5a
and 5b were determined by
29Si−1H COLOC and NOESY NMR spectra.
A mechanism
involving 1,2-migration of the methoxydisilanyl group to the metal
center was suggested.
Irradiation of the tetrasilanyl complex
CpFe(CO)2SiMe2SiMe2SiMe2SiMe2OMe
(6) caused a
complicated reaction, giving at least five products having methoxy
groups coordinated to
silylene ligands.
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