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Aluminum oxynitride films were deposited by ion beam sputtering technique at room temperature. The optical properties and morphologies of the aluminum oxynitride films were studied and reported previously. It was found that the optical properties are closely related to the O contents in the films. In this study, the structures of the films were investigated by X-ray diffractometer and XPS. Three oxidation states of N 1s in oxynitride films, N + , N 2+ and N 3+ , were clearly deduced from N 1s spectra in the amorphous films fabricated under various oxygen partial pressures (P O2 ). To our knowledge, three oxidation states of N 1s have not been simultaneously observed and reported in the aluminum oxynitride films previously. Corresponding bonding variations in Al 2p and O 1s spectra indicated more oxygen in oxynitride in the film as P O2 increases. Three aluminum oxynitride networks, AlO 2 N, AlO 2.5 N and AlO 3 N were deduced. Optical properties of aluminum oxynitride films resemble those of AlN and Al 2 O 3 films when P O2 is low and high during the deposition. The refractive indices and extinction coefficients of the aluminum oxynitride films can be adjusted by using proper P O2 during the film depositions.

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