We introduce a new optical interferometry system for fast areal surface measurement of microscale and nanoscale surfaces that are immune to environmental noise. Wavelength scanning interferometry together with an acousto-optic tunable filtering technique is used to measure surfaces with large step heights. An active servo control system serves as a phase-compensating mechanism to eliminate the effects of environmental noise. The system can be used for online or in-process measurement on a shop floor. Measurement results from two step height standard samples and a structured surface of a semiconductor daughterboard are presented. In comparison with standard step height specimens, the system achieved nanometer measurement accuracy. The measurement results of the semiconductor daughterboard, under mechanical disturbance, showed that the system can withstand environmental noise.
A wavelength scanning interferometer for measuring the surface and thickness of a transparent film has been studied. A halogen light source combined with an acousto-optic tuneable filter is used to generate a sequence of filtered light in a Linnik interferometer, which leads to a sequence of interferograms captured by a CCD camera. When a transparent thin film is measured, the reflection signals from both the top and bottom surfaces of the film will interfere with the reference signal. At the same time, the multiple reflection signals between the two film surfaces will also interfere with each other. Effective separation of the interference signals from each other is the key to achieving a successful measurement. By performing a frequency-domain analysis, these interference signals can be separated. An optimized Fourier transform method is used in the analysis. Measurements of the top and bottom surface finishes of the film, as well as the film thickness map, have been achieved. The film needs to be more than 3 µm in optical path length, and must transparent with no absorption of light. The film's refractive index needs to be known as a function of wavelength. In this paper, the theoretical analysis and simulation study of wavelength scanning interferometry for transparent film measurement is discussed. Experiments on thin film layers of Parylene N coated on a glass slide surface are studied and analyzed. Comparison study results with other contact and non-contact methods are also presented.
Wavelength scanning interferometry (WSI) can be used for surface measurement with discontinuous surface profiles by producing phase shifts without any mechanical scanning process. The choice of algorithms for the WSI to analyze the fringe pattern depends on the desired accuracy and computing speed. This paper provides comparison of four different algorithms to analyze the interference fringe pattern acquired from WSI. The mathematical description of these algorithms, their computing resolution, and speed are presented. Two step-height samples are measured using the WSI. Experimental results demonstrate that the accuracy of measuring surface height varies from micrometer to nanometer value depending on the algorithm used to analyze the captured interferograms.
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