In this paper, we present an overview of recent approaches in the gas/aerosol-through-plasma (GATP) and liquid plasma methods for synthesizing polymer films and nanoparticles (NPs) using an atmospheric-pressure plasma (APP) technique. We hope to aid students and researchers starting out in the polymerization field by compiling the most commonly utilized simple plasma synthesis methods, so that they can readily select a method that best suits their needs. Although APP methods are widely employed for polymer synthesis, and there are many related papers for specific applications, reviews that provide comprehensive coverage of the variations of APP methods for polymer synthesis are rarely reported. We introduce and compile over 50 recent papers on various APP polymerization methods that allow us to discuss the existing challenges and future direction of GATP and solution plasma methods under ambient air conditions for large-area and mass nanoparticle production.
This paper investigates the properties of thiophene and aniline copolymer (TAC) films deposited by using atmospheric pressure plasma jets copolymerization technique relative to various blending ratios of aniline and thiophene monomer for synthesizing the donor–acceptor conjugated copolymers. Field emission scanning electron microscopy (FE-SEM) and atomic force microscopy are utilized to measure the surface morphology, roughness and film thickness of TAC films. Structural and chemical properties of TAC films are investigated by Fourier transforms-infrared spectroscopy (FT-IR), time of flight secondary ion mass spectrometry, and X-ray photoelectron spectroscopy. FE-SEM images show that the film thickness and nanoparticles size of the TAC films increase with an addition thiophene monomer in the aniline monomer. FE-SEM, FT-IR results show that TAC films are successfully synthesized on glass substrates in all cases. The iodine doped TAC film on the Si substrate with interdigitated electrodes shows the lowest electrical resistance at blending condition of thiophene of 25%.
Pinhole free layers are needed in order to prevent oxygen and water from damaging flexible electrical and bio-devices. Although polymerized methyl methacrylate (polymethyl methacrylate, PMMA) for the pinhole free layer has been studied extensively in the past, little work has been done on synthesizing films of this material using atmospheric pressure plasma-assisted electro-polymerization. Herein, we report the synthesis and properties of plasma-PMMA (pPMMA) synthesized using the atmospheric pressure plasma-assisted electro-polymerization technique at room temperature. According to the Fourier transform infrared spectroscopy (FT-IR), X-ray photoelectron spectroscopy (XPS), and time of flight-secondary ion mass spectrometry (ToF-SIMS) results, the characteristic peaks from the pPMMA polymer chain were shown to have been detected. The results indicate that the percentage of hydrophobic groups (C–C and C–H) is greater than that of hydrophilic groups (C–O and O–C=O). The field emission-scanning electron microscope (FE-SEM) and thickness measurement results show that the surface morphology is quite homogenous and amorphous in nature, and the newly proposed pPMMA film at a thickness of 1.5 µm has high transmittance (about 93%) characteristics. In addition, the results of water contact angle tests show that pPMMA thin films can improve the hydrophobicity.
The use of low-voltage-driven plasma in atmospheric pressure (AP) plasma polymerization is considered as a simple approach to reducing the reactivity of the monomer fragments in order to prevent excessive cross-linking, which would have a negative effect on the structural properties of the polymerized thin films. In this study, AP-plasma polymerization can be processed at low voltage by an AP-plasma reactor with a wire electrode configuration. A bare tungsten wire is used as a powered electrode to initiate discharge in the plasma area (defined as the area between the wide glass tube and the substrate stand), thus allowing plasma polymerization to proceed at a lower voltage compared to other AP-plasma reactors with dielectric barriers. Thus, transparent polyaniline (PANI) films are successfully synthesized. The surface morphology, roughness, and film thickness of the PANI films are characterized by field emission scanning electron microscopy and atomic force microscopy. Thus, the surface of the polymerized film is shown to be homogenous, smooth, and flat, with a low surface roughness of 1 nm. In addition, the structure and chemical properties of the PANI films are investigated by Fourier transform infrared spectroscopy, thus revealing an improvement in the degree of polymerization, even though the process was performed at low voltage.
In-situ iodine (I2)-doped atmospheric pressure (AP) plasma polymerization is proposed, based on a newly designed AP plasma reactor with a single wire electrode that enables low-voltage-driven plasma polymerization. The proposed AP plasma reactor can proceed plasma polymerization at low voltage levels, thereby enabling an effective in-situ I2 doping process by maintaining a stable glow discharge state even if the applied voltage increases due to the use of a discharge gas containing a large amount of monomer vapors and doping materials. The results of field-emission scanning electron microscopy (FE-SEM) and Fourier transformation infrared spectroscopy (FT-IR) show that the polyaniline (PANI) films are successfully deposited on the silicon (Si) substrates, and that the crosslinking pattern of the synthesized nanoparticles is predominantly vertically aligned. In addition, the in-situ I2-doped PANI film fabricated by the proposed AP plasma reactor exhibits excellent electrical resistance without electrical aging behavior. The developed AP plasma reactor proposed in this study is more advantageous for the polymerization and in-situ I2 doping of conductive polymer films than the existing AP plasma reactor with a dielectric barrier.
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