X-ray reflectivity data of polymer bilayer systems have been analyzed using a Fourier method which takes into account different limits of integration in q-space. It is demonstrated that the interfacial parameters can be determined with high accuracy although the difference in the electron density (the contrast) of the two polymers is extremely small. This method is not restricted to soft-matter thin films. It can be applied to any reflectivity data from low-contrast layer systems.

Liquid octamethylcyclotetrasiloxane (OMCTS) films have been prepared between two flat silicon substrates with varying nanometer-sized gaps which correspond to two to three molecular diameters of OMCTS. These extremely confined liquid films have been investigated using X-ray scattering methods as a function of applied pressure, in particular by observing the specular reflectivity and the diffuse scattering. For the first time, scattering methods show that the gap size cannot be changed continuously with changing pressure. Instead, the gap is quantized due to ordering effects of the OMCTS molecules. The use of scattering methods has enormous future implications as they allow very detailed investigations of confined liquids at a molecular level.

A series of buried CoSi 2 layers prepared by a modified molecular beam epitaxy process ͑allotaxy͒ and a subsequent wet-oxidation process was investigated by x-ray scattering. The oxidation time which determines the depth in which the CoSi 2 layers are located within the Si substrates has been varied during the preparation. The electron density profiles and the structure of the interfaces were extracted from specular reflectivity and diffuse scattering measurements. Crystal truncation rod investigations yielded the structure on an atomic level ͑crystalline quality͒. It turns out that the roughness of the CoSi 2 layers increases drastically with increasing oxidation time, i.e., with increasing depth of the buried layers. Furthermore, the x-ray data reveal that the oxidation growth process is diffusion limited.

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