Precision measurements of 240 nm-pitch one-dimensional grating standards were carried out using an atomic force microscope (AFM) with a high-resolution three-axis laser interferometer (nanometrological AFM). Laser sources of the three-axis laser interferometer in the nanometrological AFM were calibrated with an I2-stabilized He–Ne laser at a wavelength of 633 nm. The results of the precision measurements using the nanometrological AFM have direct traceability to the length standard. The uncertainty in the pitch measurements was estimated in accordance with the Guide to the Expression of Uncertainty in Measurement. The primary source of uncertainty in the measurements was derived from interferometer nonlinearity, and its value was approximately 0.115 nm. Expanded uncertainty (k = 2) of less than 0.31 nm was obtained. It is suggested that the nanometrological AFM is a useful instrument for the nanometrological standard calibration.

We have developed a new atomic force microscope with differential laser interferometers (DLI-AFM), carried out test measurements of the prototype 1D-grating standards with pitches of 100, 80, 60 and 50 nm using the DLI-AFM and evaluated the uncertainty in the pitch measurements. In the procedures of the pitch calculation, two types of definitions of the peak positions, ‘the centre of gravity method’, and ‘the zero-crossing method’, were compared. The zero-crossing method was adopted in this study since the standard deviation of pitches by the zero-crossing method was smaller than that by the centre of gravity method. The expanded uncertainty (k = 2) was approximately 0.20 nm and was only 0.4% for the nominal pitch of 50 nm. We propose a design of usable 1D-grating standards as certified reference materials.

Intercomparison of pitch measurements for one-dimensional-grating standards (240 nm pitch), one of the widely used reference standards for nanometric lateral scales, was performed by three different methods, optical diffraction, critical dimension scanning electron microscopy and nanometrological atomic force microscopy. Average pitch values obtained by the three methods deviated by a maximum of only 0.67 nm with expanded uncertainties (k = 2) of less than 1.2 nm. The calculated E n number, the index of measurement quality, of less than 1 indicates consistency of the measured pitch values and subsequent uncertainty analyses performed by three methods.

One-dimensional grating standards with sub-hundred nanometre pitches are required for calibration of nanometrological instruments. Nanometric lateral scales (design pitches: 100, 60 and 50 nm) for the calibration of nanometrological instruments were designed and fabricated by electron beam cell projection lithography. An offset-locked laser system consisting of an I2-stabilized He–Ne laser and a slave laser was installed in an atomic force microscope with differential laser interferometers (DLI-AFM) for the realization of a continuously, directly length-standard-traceable system and the pitches of the lateral scales were calibrated using the new DLI-AFM. The average pitches were quite close to the design pitches and the expanded uncertainties (k = 2) were less than 0.6% of the design pitches. The developed nanometric lateral scales are of sufficiently high quality and are candidates for certified reference materials (CRMs).