In this paper, we have performed qualitative and quantitative analysis of LuMnO3 thin films surfaces, deposited by spin coating over Pt(111)/TiO2/SiO2/Si substrates, to evaluate their spatial patterns as a function of the film’s sintering temperature. Atomic force microscopy was employed to obtain topographic maps that were extensively analyzed via image processing techniques and mathematical tools. 3D (three-dimensional) topographical images revealed that films sintered at 650°C and 750°C presented the formation of smoother surfaces, while the film sintered at 850°C displayed a rougher surface with a root mean square roughness of ∼2.5 nm. On the other direction, the height distribution of the surface for all films has similar asymmetries and shape, although the film sintered using the highest temperature showed the lower density of rough peaks and a sharper peak shape. The advanced fractal parameters revealed that the film sintered at 850°C is dominated by low spatial frequencies, showing less spatial complexity, higher microtexture homogeneity, and uniform height distribution. These results suggest that the combination of stereometric and fractal parameters can be especially useful for identification of unique topographic spatial patterns in LuMnO3 thin films, helping in their implementation in technological applications, such as photovoltaic solar cells and information magnetic date storage and spintronic devices.

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