Microstructure and magnetic properties of sputter deposited Co/Pd multilayered perpendicular magnetization films with amorphous C or Si seedlayer were investigated. The angstrom scale surface roughness of the seedlayer causes fine crystal grains to form in the Co/Pd multilayer and to decrease the extent of intergranular exchange coupling, while it obstructs the formation of a regular interface between Co and Pd layers. The Si seedlayer, which exhibits a surface roughness lower than the C seedlayer, yields Co/Pd multilayered films with the lowest intergranular exchange coupling and the highest coercivity. The improvement in magnetic properties of the Co/Pd film with Si seedlayer is attributable mainly to the formation of Pd2Si at the interface between the Co/Pd layer and the Si seedlayer. The Pd2Si provides suitable nucleation sites for the grain growth of Co/Pd multilayered film that can be utilized as a perpendicular magnetic recording medium.
FePt dot arrays with dot sizes ranging from 100 down to 15 nm were fabricated using sputtering, annealing and patterning techniques. The dot diameter distribution and dot position deviation are greater for smaller dot arrays than for larger dot arrays. The dot arrays produced through a sequence of annealing followed by patterning have a large perpendicular magnetic anisotropy resulting from the highly L10-ordered structure and the perpendicular orientation of the [0 0 1] crystalline axis, whereas samples of annealing after patterning display a magnetic vortex structure. As the dot size reduces from 100 to 29.9 nm, the arrays produced by annealing and then patterning exhibit an increase in the remanent coercivity H
cr from 15.7 to 21 kOe because fewer defects are contained by the smaller dots. This result is explained by nucleation and domain wall propagation mechanisms. For 15.4 nm dot arrays, a model of dot with damaged edge may interpret the decreasing coercivity behaviour.
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