Sputtered iridium oxide films (SIROFs) deposited by DC reactive sputtering from an iridium metal target have been characterized in vitro for their potential as neural recording and stimulation electrodes. SIROFs were deposited over gold metallization on flexible multielectrode arrays fabricated on thin (15 microm) polyimide substrates. SIROF thickness and electrode areas of 200-1300 nm and 1960-125,600 microm(2), respectively, were investigated. The charge-injection capacities of the SIROFs were evaluated in an inorganic interstitial fluid model in response to charge-balanced, cathodal-first current pulses. Charge injection capacities were measured as a function of cathodal pulse width (0.2-1 ms) and potential bias in the interpulse period (0.0 to 0.7 V vs. Ag|AgCl). Depending on the pulse parameters and electrode area, charge-injection capacities ranged from 1-9 mC/cm(2), comparable with activated iridium oxide films (AIROFs) pulsed under similar conditions. Other parameters relevant to the use of SIROF on nerve electrodes, including the thickness dependence of impedance (0.05-10(5) Hz) and the current necessary to maintain a bias in the interpulse region were also determined.

The charge-injection limits of activated iridium oxide electrodes (AIROF) and PtIr microelectrodes with similar geometric area and shape have been compared in vitro using a stimulation waveform that delivers cathodal current pulses with current-limited control of the electrode bias potential in the interpulse period. Charge-injection limits were compared over a bias range of 0.1-0.7 V (versus Ag/AgCl) and pulse frequencies of 20, 50, and 100 Hz. The AIROF was capable of injecting between 4 and 10 times the charge of the PtIr electrode, with a maximum value of 3.9 mC/cm2 obtained at a 0.7 V bias and 20 Hz frequency.

The use of potential biasing and biphasic, asymmetric current pulse waveforms to maximize the charge-injection capacity of activated iridium oxide (AIROF) microelectrodes used for neural stimulation is described. The waveforms retain overall zero net charge for the biphasic pulse, but employ an asymmetry in the current and pulse widths of each phase, with the second phase delivered at a lower current density for a longer period of time than the leading phase. This strategy minimizes polarization of the AIROF by the charge-balancing second phase and permits the use of a more positive anodic bias for cathodal-first pulsing or a more negative cathodic bias for anodal-first pulsing to maximize charge injection. Using 0.4-ms cathodal-first pulses, a maximum charge-injection capacity of 3.3 mC/cm2 was obtained with an 0.6-V bias (versus Ag/AgCl) and a pulse asymmetry of 1:8 in the cathodal and anodal pulse widths. For anodal-first pulsing, a maximum charge capacity of 9.6 mC/cm2 was obtained with an asymmetry of 1:3 at an 0.1-V bias. These measurements were made in vitro in carbonate-buffered saline using microelectrodes with a 2000 microm2 surface area.

Penetrating microelectrode arrays with 2000 μm (2) sputtered iridium oxide (SIROF) electrode sites were implanted in cat cerebral cortex, and their long-term electrochemical performance evaluated in vivo by cyclic voltammetry (CV), electrochemical impedance spectroscopy (EIS), and current pulsing. Measurements were made from days 33 to 328 postimplantation. The CV-defined charge storage capacity, measured at 50 mV/s, increased linearly with time over the course of implantation for two arrays and was unchanged for one array. A modest decrease in 1 kHz impedance was also observed. These results suggest an ongoing increase in the apparent electrochemical surface area of the electrodes, which is attributed to electrical leakage pathways arising from cracking of Parylene insulation observed by SEM of explanted arrays. During current pulsing with a 0.0 V interpulse bias, the electrodes readily delivered 8 nC/phase in vitro, but some channels approached or exceeded the water reduction potential during in vivo pulsing. The charge injection capacity in vivo increased linearly with the interpulse bias (0-0.6 V Ag\vert AgCl) from 11.5 to 21.8 nC/ph and with pulse width (150-500 μs) from 8.8 to 14 nC/ph (at 0.0 V bias). These values are lower than those determined from measurements in buffered physiological saline, emphasizing the importance of in vivo measurements in assessing chronic electrode performance. The consequence of current leakage pathways on the charge-injection measurements is also discussed.

Sputtered iridium oxide films (SIROFs) deposited by DC reactive sputtering from an iridium metal target have been characterized in vitro for their potential as neural recording and stimulation electrodes. SIROFs were deposited over gold metallization on flexible multielectrode arrays fabricated on thin (15 µm) polyimide substrates. SIROF thickness and electrode areas of 200-1300 nm and 1960-125600 µm 2 , respectively, were investigated. The charge-injection capacities of the SIROFs were evaluated in an inorganic interstitial fluid model in response to chargebalanced, cathodal-first current pulses. Charge injection capacities were measured as a function of cathodal pulse width (0.2 -1 ms) and potential bias in the interpulse period (0.0 to 0.7 V vs. Ag| AgCl). Depending on the pulse parameters and electrode area, charge-injection capacities ranged from 1-9 mC/cm 2 , comparable with activated iridium oxide films (AIROFs) pulsed under similar conditions. Other parameters relevant to the use of SIROF on nerve electrodes, including the thickness dependence of impedance (0.05-10 5 Hz) and the current necessary to maintain a bias in the interpulse region were also determined.