The transport properties of microcrystalline silicon, namely, mobility and conductivity, are investigated by a new method, for which the simple theory as well as numerical modeling is presented. The basic idea of the new method is verified on amorphous hydrogenated silicon by comparison with the widely used time-of-flight method. Contrary to time of flight, the new method can be used even for relatively conductive materials. Preliminary results on microcrystalline silicon clearly indicate the critical role of amorphouslike tissue in transport in microcrystalline silicon.

Silicon thin films grown near the boundary between the amorphous/microcrystalline growth offer superior properties for industrial applications. Series of silicon samples, in which crossing of this transition region was achieved by changing a single technological parameter (dilution of silane in hydrogen, deposition temperature, sample thickness) were used to test our model of transport, connecting the macroscopically observed transport properties and the crystallinity, hydrogen content, grain size and grain boundaries. Microscopic study by AFM led to the formulation of the geometrical model of growth of mixed phase Si. The demand for research of microcrystalline or polycrystalline silicon prepared at low substrate temperatures is stimulated by the use of cheap plastic substrates. In addition to a direct deposition an alternative technology, such as metal-induced crystallization supported by the electric field is discussed. Possible future application of thin silicon films, for example in a "nanolithography", is also shown.

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