Articles you may be interested inOne step electronbeam lithography for multipurpose diffractive optical elements with 200 nm resolution Extendibility of xray lithography to 130 nm ground rules in complex integrated circuit patterns A multilayer inorganic antireflective system for use in 248 nm deep ultraviolet lithography Achromatic interferometric lithography is the preferred approach for producing large-area, spatially coherent 100 nm period gratings and grids. We report on improvements to processes which have enabled exposure areas of Ϸ10 cm 2 . In addition, we report on the fabrication of 100 nm period free-standing gold gratings.

Interferometers based on matter waves promise orders-of-magnitude improvements in metrology over laser-based systems by virtue of the fact that the de Broglie wavelengths of atoms are about 104 times shorter. To date, the required matched set of four aligned gratings for such atom interferometers has been made using electron beam lithography and, as a result, such gratings suffer from a lack of spatial-phase coherence. We report on processes we have developed for fabricating free-standing gratings over large areas using conventional holographic lithography and achromatic holographic lithography to achieve spatial periods of 200 and 100 nm, respectively (i.e., nominal linewidths of 100 and 50 nm, respectively).