The evolution of real-time medical diagnostic tools such as angiography and computer tomography from radiography based on photographic plates was enabled by the development of integrated solid-state X-ray photon detectors, based on conventional solid-state semiconductors. Recently, for optoelectronic devices operating in the visible and near infrared spectral regions, solution-processed organic and inorganic semiconductors have also attracted immense attention. Here we demonstrate a possibility to use such inexpensive semiconductors for sensitive detection of X-ray photons by direct photon-to-current conversion. In particular, methylammonium lead iodide perovskite (CH 3 NH 3 PbI 3 ) offers a compelling combination of fast photoresponse and a high absorption cross-section for X-rays, owing to the heavy Pb and I atoms. Solution processed photodiodes as well as photoconductors are presented, exhibiting high values of X-ray sensitivity (up to 25 µC mGy air -1 cm -3 ) and responsivity (1.9×10 4 carriers/photon), which are commensurate with those obtained by the current solid-state technology.

Instabilities in semiconductor heterostructure growth can be exploited for the self-organized formation of nanostructures, allowing for carrier confinement in all three spatial dimensions. Beside the description of various growth modes, the experimental characterization of structural properties, such as size and shape, chemical composition, and strain distribution is presented. The authors discuss the calculation of strain fields, which play an important role in the formation of such nanostructures and also influence their structural and optoelectronic properties. Several specific materials systems are surveyed together with important applications.

Silicon crystallized in the usual cubic (diamond) lattice structure has dominated the electronics industry for more than half a century. However, cubic silicon (Si), germanium (Ge) and SiGe-alloys are all indirect bandgap semiconductors that cannot emit light efficiently. Accordingly, achieving efficient light emission from group-IV materials has been a holy grail 1 in silicon technology for decades and, despite tremendous efforts 2-5 , it has remained elusive 6 . Here, we demonstrate efficient light emission from direct bandgap hexagonal Ge and SiGe alloys. We measure a sub nanosecond, temperature insensitive radiative recombination lifetime and observe a similar emission yield to direct bandgap III-V semiconductors. Moreover, we demonstrate how by controlling the composition of the hexagonal SiGe alloy, the emission wavelength can be continuously tuned in a broad range, while preserving a direct bandgap. Our experimental findings are shown to be in excellent quantitative agreement with the ab initio theory. Hexagonal SiGe embodies an ideal material system to fully unite electronic and optoelectronic functionalities on a single chip, opening the way towards novel device concepts and information processing technologies.Silicon has been the workhorse of the semiconductor industry since it has many highly advantageous physical, electronic and technological properties. However, due to its indirect bandgap, silicon cannot emit light efficientlya property that has seriously constrained potential for applications to electronics and passive optical circuitry 7-9 . Silicon technology can only reach its full application potential when heterogeneously supplemented 10 with an efficient, direct bandgap light emitter.The band structure of cubic Si, presented in Fig. 1a is very well known, having the lowest conduction band (CB) minimum close to the X-point and a second lowest * These authors contributed equally to this work. † Correspondence to E.P.A.M.(e.p.a.m.bakkers@tue.nl).minimum at the L-point.As such, it is the archetypal example of an indirect bandgap semiconductor, that, notwithstanding many great efforts 3-6 , cannot be used for efficient light emission.By modifying the crystal structure from cubic to hexagonal, the symmetry along the 111 crystal direction changes fundamentally, with the consequence that the L-point bands are folded back onto the Γ-point. As shown in Fig. 1b, for hexagonal Si (Hex-Si) this results in a local CB minimum at the Γ-point, with an energy close to 1.7 eV 11-13 . Clearly, Hex-Si remains indirect since the lowest energy CB minimum is at the M-point, close to 1.1 eV. Cubic Ge also has an indirect bandgap but, unlike Si, the lowest CB minimum is situated at the L-point, as shown in Fig. 1c. As a consequence, for Hex-Ge the band folding effect results in a direct bandgap at the Γ-point with a magnitude close to 0.3 eV, as shown in the calculated band structure in Fig. 1d 14 .To investigate how the direct bandgap energy can be tuned by alloying Ge with Si, we calculated the band structures of He...

III-V nanowires have been fabricated by metal-organic vapor-phase epitaxy without using Au or other metal particles as a catalyst. Instead, prior to growth, a thin SiOx layer is deposited on the substrates. Wires form on various III-V substrates as well as on Si. They are nontapered in thickness and exhibit a hexagonal cross-section. From high-resolution X-ray diffraction, the epitaxial relation between wires and substrates is demonstrated and their crystal structure is determined.

Group III−V nanowires offer the exciting possibility of epitaxial growth on a wide variety of substrates, most importantly silicon. To ensure compatibility with Si technology, catalyst-free growth schemes are of particular relevance, to avoid impurities from the catalysts. While this type of growth is well-documented and some aspects are described, no detailed understanding of the nucleation and the growth mechanism has been developed. By combining a series of growth experiments using metal−organic vapor phase epitaxy, as well as detailed in situ surface imaging and spectroscopy, we gain deeper insight into nucleation and growth of self-seeded III−V nanowires. By this mechanism most work available in literature concerning this field can be described.