Articles you may be interested inGrowth, microstructure, and field-emission properties of synthesized diamond film on adamantane-coated silicon substrate by microwave plasma chemical vapor deposition J. Appl. Phys. 107, 103305 (2010); 10.1063/1.3427436 n -type, p -type and semi-insulating ZnO:N thin film growth by metal organic chemical vapor deposition with N H 3 doping Effect of substrate temperature on structural and electrical properties of liquid-delivery metal organic chemical vapor deposited indium oxide thin films on silicon J. Vac. Sci. Technol. B 26, 909 (2008); 10.1116/1.2905238Growth of single crystalline GaN thin films on Si(111) substrates by high vacuum metalorganic chemical vapor deposition using a single molecular precursor Selective growth of TiO 2 thin films on Si(100) surfaces by combination of metalorganic chemical vapor deposition and microcontact printing methodsThe authors have carried out the selective deposition of magnetite iron oxide ͑Fe 3 O 4 ͒ thin films with about 50 nm thickness on Si͑100͒ surfaces which were patterned by octadecyltrichlorosilane ͑OTS͒ using microcontact printing ͑CP͒ method. The CP method showed that hydrophobic patterns with microdimension were able to be formed on hydrophilic area such as silicon surface. Iron oxide thin films were deposited on the Si͑100͒ substrates by thermal metal-organic chemical vapor deposition ͑MOCVD͒ method using single molecular organometallic precursor of iron pentacarbonly ͓Fe͑CO͒ 5 ͔ with high purity ͑99.999%͒ oxygen gas. The deposition was performed in the range of 250-350°C substrate temperature for 2 -10 min under 1 ϫ 10 −2 Torr in a homemade MOCVD system. In order to check the selectivity of as-deposited thin films optical microscopy, scanning electron microscopy, and atomic force microscopy analyses were performed. To confirm the crystallinity of deposited thin films, x-ray diffraction patterns and micro-Raman were studied. Also energy dispersive x-ray and x-ray photoelectron spectrometry results showed the composition of the as-grown iron oxide thin films. By means of these results, the authors can suggest the selective deposition mechanisms and tendencies of iron oxide thin films onto the OTS patterned Si͑100͒ surfaces.

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