We review the current understanding of intrinsic electron and hole trapping in insulating amorphous oxide films on semiconductor and metal substrates. The experimental and theoretical evidences are provided for the existence of intrinsic deep electron and hole trap states stemming from the disorder of amorphous metal oxide networks. We start from presenting the results for amorphous (a) HfO, chosen due to the availability of highest purity amorphous films, which is vital for studying their intrinsic electronic properties. Exhaustive photo-depopulation spectroscopy measurements and theoretical calculations using density functional theory shed light on the atomic nature of electronic gap states responsible for deep electron trapping observed in a-HfO. We review theoretical methods used for creating models of amorphous structures and electronic structure calculations of amorphous oxides and outline some of the challenges in modeling defects in amorphous materials. We then discuss theoretical models of electron polarons and bi-polarons in a-HfO and demonstrate that these intrinsic states originate from low-coordinated ions and elongated metal-oxygen bonds in the amorphous oxide network. Similarly, holes can be captured at under-coordinated O sites. We then discuss electron and hole trapping in other amorphous oxides, such as a-SiO, a-AlO, a-TiO. We propose that the presence of low-coordinated ions in amorphous oxides with electron states of significant p and d character near the conduction band minimum can lead to electron trapping and that deep hole trapping should be common to all amorphous oxides. Finally, we demonstrate that bi-electron trapping in a-HfO and a-SiO weakens Hf(Si)-O bonds and significantly reduces barriers for forming Frenkel defects, neutral O vacancies and O ions in these materials. These results should be useful for better understanding of electronic properties and structural evolution of thin amorphous films under carrier injection conditions.

Amorphous (a)-HfO2 is a prototype high dielectric constant insulator with wide technological applications. Using ab initio calculations we show that excess electrons and holes can trap in aHfO2 in energetically much deeper polaron states than in the crystalline monoclinic phase. The electrons and holes localize at precursor sites, such as elongated Hf-O bonds or under-coordinated Hf and O atoms and the polaronic relaxation is amplified by the local disorder of amorphous network. Single electron polarons produce states in the gap at ∼2 eV below the bottom of the conduction band with average trapping energies of 1.0 eV. Two electrons can form even deeper bipolaron states on the same site. Holes are typically localized on under-coordinated O ions with average trapping energies of 1.4 eV. These results advance our general understanding of charge trapping in amorphous oxides by demonstrating that deep polaron states are inherent and do not require any bond rupture to form precursor sites.Electron and hole states with energy levels lying deep in the bandgap impair the dielectric quality of insulating layers. In particular, electron transitions facilitated by these states account for multitude of degradation phenomena including enhanced leakage current and charge trapping eventually leading to the dielectric barrier failure and breakdown. Routinely, however, these deep electron states are seen as not inherent to the perfect material but rather associated with the presence of defects and/or impurity centers in the atomic network of an insulator. This belief offers some hope that imperfections can be eliminated by using more clean and optimized synthesis and proper processing of the insulators. On the other hand, self-trapping of excess charges in the form of small electron and hole polarons is well known to occur even in perfect crystalline oxide insulators. However, it is usually shallow, with trapping energies of the order of 0.2 eV (see e.g. [1-3]). As a result, the electron and hole polarons are mobile at room temperature in crystalline reduced TiO 2 and NiO [4], CeO 2 [5, 6], doped ZrO 2 [7,8], and in plethora of other oxides (see e.g. [1,[9][10][11][12]). The intrinsic localization of excess electrons and holes in noncrystalline materials and liquids has also been a subject of extensive experimental and theoretical studies pioneered in [13]. Structural disorder typically induces shallow electron states near the bottom of the conduction band, below the so-called mobility edge (see, e.g. [14] . In these systems, the polaronic relaxation is amplified by the local disorder of amorphous network.Here we turn to amorphous (a)-HfO 2 , which represents a wide class of high dielectric constant oxides recently emerged as the major contenders to replace SiO 2 in a broad spectrum of nano-electronic devices ranging from deep-scaled transistors to DRAM and non-volatile memory cells (see, e.g. [21,22]). Amorphous oxides make the backbone of most electronic devices and charge trapping appears to be the key factor determining devic...

Hexagonal boron nitride (hBN) is a wide gap 2D layered material with good insulating properties. Intrinsic point defects in hBN play an important role in its applications as a dielectric in 2D electronic devices. However, the electronic properties of these defects are still poorly understood. We have calculated the structure and properties of a wide range of intrinsic point defects in the bulk of hBN using hybrid density functional theory (DFT). These include vacancies and interstitial states of B and N as well as di- and tri-vacancies. For each isolated defect, multiple charge states are calculated, and for each charge state multiple spin states are investigated. Positions of defect charge transition levels in the band gap of hBN are calculated. In particular, we predict that B vacancies are likely to be negatively charged in contact with graphene and other metals. Calculations of the interaction between vacancies predict that divacancies in both B and N sublattices are strongly binding. Moreover, the interaction of single B and N vacancies in adjacent layers induces the creation of -N–N- and -B–B- molecular bridges, which greatly distort the local structure, leading to local bond weakening. These results provide further insight into the properties of defects which can be responsible for degradation of hBN based devices.