A New benzylidene derivative namely benzylidene-5-phenyl-1,3,4-thiadiazol-2-amine (BPTA), was successfully synthesized and characterized using Fourier Transform Infrared Spectroscopy, Nuclear Magnetic Resonance and elemental analysis (CHN) techniques. The inhibition efficiency of BPTA on mild steel corrosion in 1.0 N HCl was tested at various temperatures. The methodological work was achieved by gravimetric method complemented with morphological investigation. The concentrations of inhibitor were 0.1, 0.2, 0.3, 0.4 and 0.5 mM at the temperatures 303, 313, 323 and 333 K. The BPTA, molecules as become superior corrosion inhibitor with 92% inhibition efficiency of mild steel coupon in the acidic environment. The inhibition efficiency increased with increasing concentrations of BPTA and the excellent efficiency was performed with the 0.5 mM concentration and followed with 0.4 mM. In acidic environment, the 0.5 and 0.4 mM gave the optimum performance with weight loss technique and scanning electron microscopy analysis. On the other hand, the inhibition efficiency decreased with the increase of temperature. Results of BPTA indicated mixed type inhibitor and the adsorption on the mild steels surface obeys the Langmuir adsorption isotherm. It was found that the BPTA performance depend on the concentration and the solution temperature. Quantum chemical calculations have been done to correlate the electronic characteristics of BPTA with the corrosive inhibitive impact. Experimental and theoretical results are in good agreement.

In this work, the electrical properties and optimum conditions of the plasma sputtering system have been studied. The electrical properties such as Paschen's curve, current-voltage, current pressure relations, the strength of magnetic field as a function of inter-electrode distance, the influence of gas working pressure and argon-oxygen ratio on the electrical characterization were studied to determine the basic optimum condition of the system operation. the discharge current as a function of discharge voltage showed high discharge current at 2.5 cm.  These parameters represent the basic conditions to operate any plasma sputtering system which are the right behavior to build up and design the discharge an electrode. The ideal conditions of these homemade systems were qualified to prepare the various nanostructure thin films. The  two electrodes were made of copper  because of its  good conductivity, and to avoid the power dissipation  inside discharge chamber.

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