We report the use of a simple close-spaced vapor transport technique for the growth of high-quality epitaxial GaAs films using potentially inexpensive GaAs powders as precursors.

III–V semiconductors form the most efficient single- and multijunction photovoltaics. Metal–organic vapor-phase epitaxy, which uses toxic and pyrophoric gas-phase precursors, is the primary commercial growth method for these materials. In order for the use of highly efficient III–V-based devices to be expanded as the demand for renewable electricity grows, a lower-cost approach to the growth of these materials is needed. This Review focuses on three deposition techniques compatible with current device architectures: hydride vapor-phase epitaxy, close-spaced vapor transport, and thin-film vapor–liquid–solid growth. We consider recent advances in each technique, including the available materials space, before providing an in-depth comparison of growth technology advantages and limitations and considering the impact of modifications to the method of production on the cost of the final photovoltaics.

Precursor and substrate costs currently limit the adoption of III-V photovoltaics for large scale manufacturing. Here, we use water-mediated close-spaced vapor transport (CSVT) to produce homojunction GaAs devices with pressed GaAs powder as an alternative to expensive gas-phase precursors. These unpassivated devices reach V oc > 910 mV, demonstrating the plausibility of CSVT as an alternative method for growth of III-V epitaxial films for photovoltaic devices. We find that Zn-doping of the absorber films decreases after a number of growths cycles using a single source, which suggests an alternative transport agent should be investigated for p-type doping. Performance of these solar cells is largely limited by formation of macroscopic surface defects which we find to be caused by particulate transfer from the source material and the formation of oxide phases during growth. We present strategies for mitigating these defects and improving device performance.