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In cloud storage system, when we search similar documentation files, keyword-based similarity evaluation scheme is well performed. However, if we want to find similar binary files then it is very difficult to satisfy user request. Because there is no widely used binary file search system that supports similarity evaluation among files. File similarity evaluation is essential for digital forensic and data deduplication field. In the file similarity processing time, the CPU consumption and resource overhead of memory are increased as the number of files increase. Moreover, as the file size is getting bigger, the overhead of metadata management is critical. In this paper, we suggest the similarity evaluation scheme using a hybrid chunking which reduce overall processing time of similarity evaluation. Experiment result shows that the proposed system can reduce processing time and data storage capacity effectively.

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As the IC industry is moving toward 90nm node or below, the critical dimension size of implant layers has shrunk to 250nm or smaller. To achieve better CD uniformity, dyed KrF resist and top anti-reflective coating (TARC) are commonly used in advanced photo process of implant layers, while typical organic BARC are not used because it requires dry etch process that damages the substrate and needs additional process steps.In order to overcome those shortcomings, developable BARC is introduced. It is a new type of BARC which is soluble to developer, TMAH solution, in the resist development step. This developer-soluble KrF BARC consists of polyamic acid 1 and its solubility to alkaline could be adjusted by changing bake condition.In this experiment, we evaluated the margin of developable BARC process. Developable BARC reduces the standing wave of photoresist and improves the ID bias and CD uniformity as applied to implant feature printing. However, Developable BARC has a narrow thermal process margin. It is the profile of developable BARC that easily changes according to the coating thickness or thermal process conditions. Even in the same bake conditions, developable BARC profile changes according to the pattern densities.To observe the effects of developable BARC on the device performance, we compare electrical data of devices produced with and without developable BARC. They have the differences in the threshold voltage, leakage current and saturation current. Probably, the residues of the developable BARC after the development bring about the differences.