A simple, low-cost method of preparing photocatalytic TiO2 thin films using RF plasma has been developed, offering known elemental composition, homogenous depositions, and easily modifiable crystallinity and surface properties.
Submonolayer coverages of triphenylphosphine-protected Au9 clusters on mica and TiO2 substrates were achieved through the development of a Pulsed Nozzle Cluster Deposition (PNCD) technique under high vacuum conditions.
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