A 5.5 inch full high definition (FHD, 1920 × 1080) printed flexible OLED display (high resolution up to 402ppi) was fabricated with inkjet printing technology. Special sub-pixel arrangement of Green-Green-Blue (GGRB) was employed to show the potential of inkjet printed top-emission OLED in mobile display application. The electro-luminance performance of both bottom-emission and top-emission printed OLED was investigated.

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Instead of the traditional heating method, the cavity length of an internal-mirror He-Ne laser is controlled by air cooling which is implemented by a mini cooling fan. The responsive property of the cooling fan and the thermal expansion of the internal-mirror laser tube are investigated. According to these investigations, a controlling system is designed to drive the cooling fan controlling the cavity length of the laser. Then the frequency is stabilized by comparing the light intensities of two operating longitudinal modes. The results of beating with an iodine stabilized He-Ne laser show that a relative uncertainty (Δf/f-) of 4.3×10(-9) in 5 months, a frequency fluctuation of <1.4 MHz, and an Allan deviation of 6×10(-11) (τ=10,000 s) in 20 h are obtained.

This paper reports the eighth set of results of a series of grouped laser comparisons from national laboratories undertaken by the Bureau International des Poids et Mesures (BIPM) at the request of the Comité Consultatif pour la Définition du Mètre (CCDM, now the Consultative Committee for Length, CCL) during the periods July 1993 to September 1995 and March 1997 to July 1997. This comparison, like the previous seven, is expected to be listed as a key comparison in the context of the ongoing BIPM.L-K10 series. The results of this comparison involving five lasers, four from three countries of the Asia-Pacific group and one from the BIPM, meet the goals set by the CCDM in 1992 and adopted by the International Committee of Weights and Measures (CIPM) the same year. The standard uncertainty (1 ) of the frequency of the He-Ne laser stabilized on the saturated absorption of 127 I 2 at λ 633 nm is reduced to the level of 12 kHz (2.5 10 -11 ) when the lasers compared meet the recommended values of the parameters.The lasers were first compared with the BIPMP3 laser, with all the lasers set to the parameter values normally used in each laboratory; the results then ranged from -112.7 kHz to +24.9 kHz. After checking and correcting the values of all the parameters and replacing a contaminated iodine cell, the range was reduced to -31.5 kHz to +14.3 kHz. Under the latter conditions, the average frequency difference of the group of lasers, with respect to the BIPM4 laser, was -1.9 kHz with a standard uncertainty (1 ) of 20.2 kHz. The best frequency stabilities, with relative Allan standard deviations of about 6.6 10 -12 , 6.0 10 -13 and 1.3 10 -13 , were observed with sampling times of 1 s, 100 s and 1000 s, respectively. The overall best value was 9.5 10 -14 for a sampling time of 6000 s.

Standing wave of laser light acts as an array of lenses to focus the moving atoms in atom lithography. The position between standing wave and substrate plays an important role in determining the quality of depositional nanometer lines. Using the rule of Gaussian beam, a method of accurately identifying the position of standing wave of laser light is reported. By adjusting accurately the displacement stage which carries the beam focus lens and reflective mirror, the laser beam is subsequently shielded by depositional substrate. Signal of photoelectric detector is changed because of shielding the standing wave, so we can convert the displacement of standing wave into electrical signal. Positioning the standing wave against substrate is achieved by using the value of waist diameter of standing wave of laser light. Theoretical model is developed according to the experimental process. The result of numerical computation coincides well with the experimental record. This method realizes accurately positioning standing wave of laser light against substrate, and it provides the experimental basic for deeply studying the influence of the distance between standing wave and substrate on the quality of depositional nanometer lines.