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The crystal structure of sputter deposited chromium thin films on Coming 7059 glass, polytetrafluoroethylene, and cold rolled (110) oriented low carbon steel a-Fe substrates was investigated as a function of 0 and C incorporation into the growing Cr film. The as-deposited crystal structure of the films was found by X-ray diffraction to be either highly oriented (110) BCC a-Cr or (200) oriented A-15 8-Cr. Chemical analysis of the films by Auger electron spectroscopy determined that the 8-Cr phase formed when the combined 0 and C impurity concentration in the film was -15-30 at.%. At total impurity concentrations above -30 at.% or below -10 at.% standard BCC a-Cr formed. The crystal structure of the films was not influenced by the substrate material. X-ray photoelectron spectroscopy of the Cr 2pl/ 2 -2p 3 / 2 orbitals indicated that the dominate binding state of both the BCC a-Cr and A-15 8-Cr films was characteristic of elemental Cr. Vacuum annealing of the A-15 8-Cr films at 500WC for one hour transformed the crystal structure into BCC a-Cr without a measurable change in chemical composition. The incorporation of 0 and C into the growing Cr film is believed to impurity stabilize the A-15 structure and favor its formation over the BCC structure.