Optical metasurfaces (OMSs) have shown unprecedented capabilities for versatile wavefront manipulations at the subwavelength scale. However, most well-established OMSs are static, featuring well-defined optical responses determined by OMS configurations set during their fabrication, whereas dynamic OMS configurations investigated so far often exhibit specific limitations and reduced reconfigurability. Here, by combining a thin-film piezoelectric microelectromechanical system (MEMS) with a gap-surface plasmon–based OMS, we develop an electrically driven dynamic MEMS-OMS platform that offers controllable phase and amplitude modulation of the reflected light by finely actuating the MEMS mirror. Using this platform, we demonstrate MEMS-OMS components for polarization-independent beam steering and two-dimensional (2D) focusing with high modulation efficiencies (~50%), broadband operation (~20% near the operating wavelength of 800 nanometers), and fast responses (<0.4 milliseconds). The developed MEMS-OMS platform offers flexible solutions for realizing complex dynamic 2D wavefront manipulations that could be used in reconfigurable and adaptive optical networks and systems.

Material costs may be reduced and electrical properties improved by utilizing thinner solar cells. Light trapping makes it possible to reduce wafer thickness without compromising optical absorption in a silicon solar cell. In this work we present a comprehensive comparison of the light-trapping properties of various bi-periodic structures with a square lattice. The geometries that we have investigated are cylinders, cones, inverted pyramids, dimples (half-spheres), and three more advanced structures, which we have called the roof mosaic, rose, and zigzag structure. Through simulations performed with a 20 μm thick Si cell, we have optimized the geometry of each structure for light trapping, investigated the performance at oblique angles of incidence, and computed efficiencies for the different diffraction orders for the optimized structures. We find that the lattice periods that give optimal light trapping are comparable for all structures, but that the light-trapping ability varies considerably between the structures. A far-field analysis reveals that the superior light-trapping structures exhibit a lower symmetry in their diffraction patterns. The best result is obtained for the zigzag structure with a simulated photo-generated current Jph of 37.3 mA/cm2, a light-trapping efficiency comparable to that of Lambertian light-trapping.

We demonstrate the fabrication of diffraction-limited dielectric metasurface lenses for NIR by the use of standard industrial high-throughput silicon processing techniques: UV nano imprint lithography (UV-NIL) combined with continuous reactive ion etching (RIE) and pulsed Bosch deep reactive ion etching (DRIE). As the research field of metasurfaces moves towards applications, these techniques are relevant as potential replacements of commonly used cost-intensive fabrication methods utilizing electron beam ithography. We show that washboard-type sidewall surface roughness arising from the Bosch DRIE process can be compensated for in the design of the metasurface, without deteriorating lens quality. Particular attention is given to fabrication challenges that must be overcome towards high-throughput production of relevance to commercial applications. Lens efficiencies are measured to be 25.5% and 29.2% at wavelengths λ = 1.55μm and λ = 1.31μm, respectively. A number of routes towards process optimization are proposed in relation to encountered challenges.