GaAs 1Àx Bi x has been grown by solid-source molecular beam epitaxy using varying substrate rotation rates. Changes in local bismuth saturation were studied by varying the Bi/Ga pressure ratio across the wafer. Films were grown on both GaAs and InGaAs buffer layers with varying indium content to change the strain conditions of the bismide layer and the out-of-plane growth rate. All samples demonstrated vertical composition modulations with a period of $ 4 nm that tracked with the rate of growth per substrate rotation cycle. The thermal stability of these composition modulations was shown to behave similarly to bulk GaAsBi. Bismide composition modulations are attributed to the low growth temperature and the varying Bi/Ga pressure ratio across the sample rather than the varying V/III ratio.

Films of n-GaAs1-xBix films were grown via molecular beam epitaxy using both Si and Te as dopant sources. Electron mobility was characterized by Hall effect measurements as a function of carrier concentration and Bi content for films with bismuth fractions of x = 0.02 and x = 0.06. While GaAsBi:Te shows lower majority carrier mobility than GaAsBi:Si at low Bi concentrations, the two become comparable as Bi content increases. Furthermore, it was observed that in the presence of bi-metallic Bi-Ga droplets on the film surface, films doped with Si display p-type behavior, likely due to Si preferentially occupying group-V sites. The use of Te as a dopant always resulted in n-type epilayers, making it a more reliable dopant choice for high Bi content films. Finally, ex situ annealing was studied as a method to improve majority carrier mobility in GaAs0.98Bi0.02:Te films, with a 10 min anneal at 350 °C resulting in a 30% improvement in electron mobility. Improvement of film quality was confirmed through spectroscopic ellipsometry examination of film optical properties. Annealing at higher temperatures resulted in electrical, optical, and structural degradation of the GaAsBi films.

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Due to its refractory properties and higher oxidation resistance, iridium (Ir) exhibits great potential for applications such as thermophotovoltaic emitters or contamination sensing. However, the lack of its temperature-dependent optical data prevents accurate modeling of Ir-based optical devices operating at higher temperatures. In this work, refractive indices of as-deposited and annealed Ir films, sputter-deposited, are characterized at between room temperature and 550°C over 300 nm to 15 µm of wavelength. The extinction coefficients of both as-deposited and annealed Ir films tend to decrease as temperature increases, with the exception of as-deposited Ir at 550°C due to significant grain growth. Under 530°C, optical constants of as-deposited Ir are less sensitive to temperature than those of annealed Ir. These characteristics of Ir films are correlated with their microstructural changes.