Background There are various surgical approaches of hysterectomy for benign indications. This study aimed to compare vaginal hysterectomy (VH) and laparoscopic hysterectomy (LH) with respect to their complications and operative outcomes. Methods We selected randomised controlled trials that compared VH with LH for benign gynaecological indications. We included studies published after January 2000 in the following databases: Medline, EMBASE, and CENTRAL (The Cochrane Library). The primary outcome was comparison of the complication rate. The secondary outcomes were comparisons of operating time, blood loss, intraoperative conversion, postoperative pain, length of hospital stay and duration of recuperation. We used Review Manager 5.3 software to perform the meta-analysis. Results Eighteen studies of 1618 patients met the inclusion criteria. The meta-analysis showed no differences in overall complications, intraoperative conversion, postoperative pain on the day of surgery and at 48 h, length of hospital stay and recuperation time between VH and LH. VH was associated with a shorter operating time and lower postoperative pain at 24 h than LH. Conclusions When both surgical approaches are feasible, VH should remain the surgery of choice for benign hysterectomy. Electronic supplementary material The online version of this article (10.1186/s12905-019-0784-4) contains supplementary material, which is available to authorized users.

In this study, the atomic layer etching characteristics and the etch mechanism of ͑100͒ InP as functions of Cl 2 pressure and Ne neutral beam irradiation dose were investigated. When Cl 2 pressure and Ne neutral beam irradiation dose were lower than the critical values of 0.4 mTorr and 7.2 ϫ 10 15 at./ cm 2 cycle, respectively, the InP etch rate ͑Å/cycle͒ and the InP surface roughness varied with Cl 2 pressure and Ne neutral beam irradiation dose. However, when the Cl 2 pressure and Ne neutral beam irradiation dose were higher than the critical values, the InP etch rate remained as 1.47 Å / cycle, corresponding to one monolayer per cycle, and the surface roughness and the surface stoichiometry remained similar to those of InP before etching.

Lipoleiomyoma is an uncommon neoplasm of the uterus, composed of smooth muscles intermixed with mature adipocytes. These tumors are considered a benign variant of uterine leiomyomas. Herein, we report six cases of lipoleiomyoma experienced in our institution from January 2005 to March 2015. The patients ranged in age from 45 to 70 years; the etiology may be related to estrogen deficiency occurring after menopausal transition. Except for one lipoleiomyoma in the broad ligament, all others were found in the uterine corpus. The presenting symptoms were nonspecific, and most cases were incidentally diagnosed during surgery for other reasons. We performed preoperative imaging studies, including abdominal and pelvic computed tomography and magnetic resonance imaging. Preoperatively, four patients were diagnosed as having a pelvic mass and one patient was diagnosed as having a right ovarian mature teratoma. In one case, we found a gynecologic malignancy (cervical cancer 1A1). Histologically, there was no gross or microscopic contiguity between the lipoleiomyoma and the malignancy. Lipoleiomyomas seem to have a benign clinical course. In our study, there were no recurrences of or deaths attributed to the lipoleiomyomas during a mean follow-up period of 16.17 ± 23.80 months.

High-rate dry etching characteristics of aluminum-doped zinc oxide (AZO) have been investigated in inductively coupled plasma (ICP) using BCl 3 /CH 4 /H 2 plasma chemistry. Etch rates were measured as a function of BCl 3 flow rate in BCl 3 /CH 4 /H 2 mixture and dc-bias voltage. Measurement of etch rate, and etched sidewall profile were performed using a stylus profilometer and scanning electron microscopy, respectively. The highest AZO etch rate about 310 nm/min, could be obtained near 80% BCl 3 and at dc-bias voltage of À350 V.

Impact of annealing on the chemical structure and morphology of the thin-film CdTe/ZnO interface J. Appl. Phys. 116, 024312 (2014); 10.1063/1.4890235 Fabrication of ZnO photonic crystals by nanosphere lithography using inductively coupled-plasma reactive ion etching with CH 4 / H 2 / Ar plasma on the ZnO/GaN heterojunction light emitting diodes J. Vac. Sci. Technol. A 28, 745 (2010); 10.1116/1.3357282 Evolution of surface morphology of dry-etched ZnO with Cl 2 / Ar plasma J.Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO filmsEtching characteristics of ZnO are investigated by means of inductively coupled plasma ͑ICP͒ reactive ion etching in BCl 3 -based plasmas. Etch rates are studied as a function of BCl 3 /Cl 2 /Ar chemistries, substrate temperature, ICP coil power, rf power, and working pressure. Surface profilometer, scanning electron microscopy, and atomic force microscopy are used to characterize etch rates, etch profiles, and the surface morphologies of etched samples. It is shown that the etch rate is determined by the BCl 3 content in the plasma. Auger electron spectroscopy results demonstrate that the BCl 3 -based etching process produces negligible changes in the surface stoichiometry of ZnO.