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The work deals with hardware and software proposal of a system suitable for control and visualization of scanning process based on resistivity measurement. Three axis positioning system with conductive contact probe is utilized. The user application was created in MATLAB programming environment. Important part of the design represents the definition of requirements, choice of the appropriate tools, functions and structures needed for reliable realization. Proposed user application allows setting key parameters of the measurement, appropriate method of data acquisition as well as performing online 3D visualization of measured data. The functionality of the application is verified via measurement of a several selected samples. Results of these measurements are also presented.

In this article, atomic force microscopy and its variation scanning microwave microscopy were used for characterization of the epitaxial layers with different dopant doping levels specified by the manufacturing data. The vapour phase epitaxy was used for the deposition of individual layers on a silicon substrate. The measured data were visualized and compared with the manufacturing data.