No abstract

Titanium films prepared by standard direct-current (DC) magnetron physical vapor deposition (PVD) and ionized metal plasma PVD (I-PVD), with Al (0.5wt.%Cu) films on them, were studied. The surface roughness, reflectivity, and crystalline texture of Ti on SiO 2 /Si and Al on TiN/Ti/SiO 2 /Si were investigated with the same thickness of Al, TiN, and Ti. The surface roughness of Al films with Ti/TiN underlayers was found to be capable of monitoring Al (111) texture. So, the reflectivity of Al/TiN/Ti film stack can be used as a quick monitor for the electromigration (EM) lifetime.