Multilayers of so-called 2D van der Waals materials have gained considerable attention as active components of next-generation electronic and optoelectronic technologies, with semiconducting black phosphorus (BP) regarded as one of the most promising systems. The applicability and performance limits of BP in both stand-alone and heterostructure-based multilayer devices are determined by individual flake charge transport properties, which synergistically depend on the number of layers and the strength of interlayer coupling between those. In this work, we study the DC electrical transport characteristics of high-quality BP field-effect devices within a wide range of flake thicknesses at room temperature. The experimental data show a non-trivial increase in conductivity and hole density with a reduced number of layers while maintaining constant field-effect mobility due to the prevalence of electron–phonon scattering. Based on the solution of the 1D Schrödinger–Poisson equation, we find that the observed phenomena are a direct consequence of non-negligible interlayer coupling, which in turn causes a local redistribution of free charge carriers towards the central layers. Our data show that due to the electrostatic conditions at the flake surfaces, a naturally protected 2D hole gas can be encapsulated in flakes as high as 10 nm, which preserves the bulk-like bandgap and effective carrier masses due to the electrostatic environment.
Van der Waals materials exhibit intriguing properties for future electronic and optoelectronic devices. As those unique features strongly depend on the materials' thickness, it has to be accessed precisely for tailoring the performance of a specific device. In this study, a nondestructive and technologically easily implementable approach for accurate thickness determination of birefringent layered materials is introduced by combining optical reflectance measurements with a modular model comprising a 4×4 transfer matrix method and the optical components relevant to light microspectroscopy. This approach is demonstrated being reliable and precise for thickness determination of anisotropic materials like highly oriented pyrolytic graphite and black phosphorus in a range from atomic layers up to more than 100 nm. As a key feature, the method is well‐suited even for encapsulated layers outperforming state of‐the‐art techniques like atomic force microscopy.
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