In this study, a coiled anode that generates a magnetic field using a direct current (DC) arc was designed and employed in a cathodic vacuum-arc deposition system. Its performance was evaluated by the formation of TiN films with and without a magnetic field. When the magnetic field was applied by the coiled anode, the deposition rate was approximately 1.5 times faster than that without the magnetic field. In addition, a reduction in the number of droplets with films of the same thickness was expected. Furthermore, the hardness of the film was improved by approximately 10% with the magnetic field of the coiled anode, resulting in a very hard film of 43.7 GPa. These results suggest that the coiled anode is effective in reducing the number of droplets and is promising for the formation of super-hard films, which are preferred for cutting tools.

Vacuum arc deposition (VAD), which utilizes the vapored high energy metal ions from an electrode, is widely used in industry. Though VAD have many advantages, reduction of droplets on deposited films is an essential issue to solve for industrial application. In this study, we have developed a new type of filtered arc deposition (FAD) utilizing a winding coil with copper C-ring-shaped plates in vacuum chamber. TiN films were deposited on substrates with a normal linear FAD and the new FAD. TiN films were analyzed, and it was found that the number of droplets were significantly reduced with the new FAD.