This study proposes the unique method to analyze the cleanliness of the fine metal mask (FMM) used in OLED display manufacturing after FMM cleaning process. We developed a FMM-mimic microstructure as a substitute for the FMM, which can be used for the evaluation of cleaning efficiency. The FMM-mimic microstructure was fabricated using a combination of photolithography, reactive ion etching, anodic bonding and sand blasting processes. To demonstrate the proposed cleanliness analytical method, a 1.4 μm-thick Tris-(8-hydroxyquinoline) aluminum (Alq 3 ) film was deposited on the FMM-mimic microstructure as a contaminant by vacuum thermal evaporation. The Alq 3 -deposited FMM-mimic microstructure was cleaned by N-methyl-2-pyrrolidone (NMP) with changing cleaning time. We analyzed the residual contaminants on the FMM-mimic microstructure using a fluorescence microscope. The developed FMMmimic microstructure proves very convenient for inspecting the residual contaminant inside the gap through the transparent glass by general optical and fluorescence microscopy. which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.

This study introduces area-selective atomic layer deposition (AS-ALD) using fluorocarbon (FC) mask patterns with low surface energy. FC mask patterns were formed on a glass substrate by inkjet printing method. The surface energy of the printed FC thin film was 13.04 dyne/cm enough low to inhibit nucleation and growth during ALD. 10 m wide Al2O3 patterns were selectively formed by removal of FC mask patterns using oxygen plasma after Al2O3 ALD processes.