We present a novel binder-free multiwall carbon nanotube (MWCNT) structure as an anode in Li ion batteries. The interface-controlled MWCNT structure, synthesized through a two-step process of catalyst deposition and chemical vapor deposition (CVD) and directly grown on a copper current collector, showed very high specific capacity, almost three times as that of graphite, excellent rate capability even at a charging/discharging rate of 3 C, and no capacity degradation up to 50 cycles. Significantly enhanced properties of this anode could be related to high Li ion intercalation on the carbon nanotube walls, strong bonding with the substrate, and excellent conductivity.
Two-dimensional MoS2 is a promising material for next-generation electronic and optoelectronic devices due to its unique electrical and optical properties including the band gap modulation with film thickness. Although MoS2 has shown excellent properties, wafer-scale production with layer control from single to few layers has yet to be demonstrated. The present study explored the large-scale and thickness-modulated growth of atomically thin MoS2 on Si/SiO2 substrates using a two-step sputtering-CVD method. Our process exhibited wafer-scale fabrication and successful thickness modulation of MoS2 layers from monolayer (0.72 nm) to multilayer (12.69 nm) with high uniformity. Electrical measurements on MoS2 field effect transistors (FETs) revealed a p-type semiconductor behavior with much higher field effect mobility and current on/off ratio as compared to previously reported CVD grown MoS2-FETs and amorphous silicon (a-Si) thin film transistors. Our results show that sputter-CVD is a viable method to synthesize large-area, high-quality, and layer-controlled MoS2 that can be adapted in conventional Si-based microfabrication technology and future flexible, high-temperature, and radiation hard electronics/optoelectronics.
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