Systematic effort was made to optimize the quality of ferroelectric
Bi3.25La0.75Ti3O12
thin films, that were pulsed laser deposited onto indium–tin-oxide coated glass
plates, by varying the conditions of laser fluence density, partial oxygen pressure
and post-annealing temperature. Characterizations from the dielectric and
ferroelectric measurements concluded that the films deposited with a laser power of
2.5 J cm−2, a deposition pressure of 200 mTorr and an annealing temperature of
650 °C
showed the finest electrical properties, consisting of remnant polarization
(2Pr) and coercive
field (Ec) values
of 28–32 µC cm−2
and 90–100 kV cm−1, respectively. No significant reduction in switching polarization magnitudes were observed until
1 × 1011
switching cycles, indicating that these electrical properties and the relevancy of the film
with metallic-oxide ITO electrodes have satisfied the necessary requirements for
applications in nonvolatile ferroelectric memory devices.
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