A coherent scattering microscope for extreme ultraviolet (EUV) light has been developed for the actinic inspection of EUV lithography masks. It was installed at the NewSUBARU synchrotron facility. It provides aberration-free, diffraction-limited imaging and a high numerical aperture. Coherent EUV light scattered (diffracted) from a mask is recorded using an EUV charged coupled device camera with a numerical aperture of 0.15. An image of the sample is reconstructed using a hybrid input-output algorithm, which retrieves the phase from the intensity data. Masks containing periodic line-and-space and hole patterns with a half-pitch ranging from 100to400nm were fabricated in the laboratory and imaged. The reconstructed images correlate well with images obtained with a scanning electron microscope (SEM). The actinic critical dimension of the linewidth of TaN absorber patterns on a mask was measured and was consistently found to be 25nm larger than that obtained from the SEM data.

In this paper, we investigated how the physical properties of wool woven fabrics influenced the good or poor appearance of suit jackets. We measured physical properties (tensile, shear, bending and compression properties measured by the KES system, dimensional change and formability) of twenty kinds of wool woven fabrics which had some poor appearances. And we discussed the relationship between the physical properties of wool woven fabrics and the appearance evaluation results of suit jackets evaluated by specialists using the discriminant analysis. From the result, it was found that appearance at the seam part (Z 1) was influenced by shear property, compression property and formability, and appearance at the front part (Z 2) was by shearing hysteresis and formability.