Atomic layer deposition of hafnium oxide from tetrakis (diethylamino) hafnium (TDEAH) and water vapor was employed to create thin films on silicon with reactor temperatures as low as 30o C. Spectral ellipsometry and X-ray photoelectron spectroscopy were used to probe the thickness and composition of these films. Deposition at the same temperature of 30o C was carried out on poly-caprolactone (PCL) nanofibers as a template to examine the possibility of fabricating hafnium oxide nanotubes. Energy dispersive X-ray scans and scanning electron microscope images revealed significant hafnia coverage on the fibers, suggesting that hafnium oxide nanotubes can be formed by means of polymer vaporization after deposition.