Purpose: The fi eld of Positive Organizational Scholarship (POS) experiences recently a dynamic growth. Many conceptual frameworks are created and empirically tested. Recently the model of positive orientation with positive leadership as one of its dimensions has been conceptualized and operationalized. The purpose of the paper is to measure the infl uence of some of the antecedents on positive leadership and the impact of positive leadership on some of its consequences.Methodology/approach: Among antecedents we have chosen life orientation and resilience. Life orientation assesses individual diff erences in generalized optimism versus pessimism, resilience is the ability to bounce back or recover from stress. Among consequences we have chosen fl ourishing, satisfaction with life and subjective happiness. We test the conceptual model in the quantitative research with the use of reliability, correlation and linear regression methods. Findings:Research results show that both optimism and high resilience positively infl uence positive leadership which in turn impacts fl ourishing, satisfaction with life and subjective happiness. Implications/limitations:The results provide implications mainly for research and business practice. Implications for research include directing attention at some of the relations that have not been researched before. Research results provide practical recommendations on how to shape positive leadership and, in turn build positive outcomes in employees' lives. Originality/value: Some of the relationships presented in the paper have not been researched yet. The main value of the paper is taking the next step in uncovering the nature, antecedents and consequences of positive style of leadership.

Velopharyngeal closure plays an important role in preventing air pressure leakage during swallowing and phonation from oropharynx to nasopharynx. Levator veli palatini muscle activity is influenced by oral and nasal air pressure, volume of the swallow bolus and postural changes. However, it is unclear how velopharyngeal closing pressure is affected by reclining posture. The purpose of this study was to investigate the effects of reclining posture on velopharyngeal closing pressure during swallowing and phonation. Nine healthy male volunteers (age range, 27-34 years) participated in this study. Velopharyngeal closing pressure during a dry swallow, a 5-mL liquid swallow, a 5-mL honey-thick liquid swallow and phonations of /P∧/ and /K∧/ were evaluated in an upright posture and at reclining postures of 60° and 30°. A manometer catheter was inserted transnasally onto the soft palate, and each trial was repeated three times. A solid-state manometer catheter with an intra-luminal transducer was used to evaluate the amplitude and duration of each trial, and data were statistically analysed. Average amplitudes during dry and liquid swallows were significantly lower in reclining postures compared with the upright posture, but the amplitude was not significantly different during the thick liquid swallow. Average durations were not affected by postural changes. The amplitudes during phonations were lower in reclining postures, but the differences were not significant. Velopharyngeal closure is significantly affected by reclining posture. This suggests that velopharyngeal closing pressure may be adjusted according to afferent inputs, such as reclining posture and bolus viscosity.

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The refractive hinary aplanatic lenses with dimensions of the wavelength scale have been fabricated and characterized by optical measurements. We fabricated lenses with flD ratio close to one where f is the effective focal length and D is the lens diameter. Light intensity was measured on the focal surface of lenses using three independent methods and it has been demonstrated that IR light energy was concentrated within an area of diameter probably smaller than 20 pm. Operation of such lens cannot he explained on the basis of ray optics or simulated using scalar diffraction theory which provided contradictory results. DESIGNThe refractive type of lens has been chosen on a basis of prediction put forward in [ 11 where a virtue of this type has been indicated against diffractive Fresnel binary lenses operating in the long wavelength infrared spectral range (LWIR). In these devices diffraction in the edge Fresnel zones depends on polarization and the vector nature of fields and its efficiency may change rapidly with incidence angle and the wavelength of illumination. We approach the problem of design and fabrication of lenses guided also by works [2 and 31. Our primary design was a stepwise approximation of aplanatic lens having large aperture. We have approximated lens having radius of 38pm, diameter of 50pm and 9pm sag by the binary 8 -level deep 3D structure with 1.15 pm high steps. The focal plane of this lens is located 42pm away from the stmcture lowest level. It was assumed that the spherical illumination wave has radius of 170pm. TECHNOLOGYThe deep silicon etching required to shape a lens is a complicated task for some reasons.First, this process can hardly be done using conventional reactive ion etching (NE) method.During the development of RIE we faced a serious problem of etch front roughness. At the bottom of the etched groove we had an unwanted phenomenon (silicon grass) which became more pronounced when we applied higher DC bias. Without this bias anisotropic etch was not possible.Second, we faced a problem of surface planarization needed for conventional photolithography. In the .,binary" process the last etch step is masked by photo resist spun over a pattem which is approx. 4.5 pm deep. We find this way of processing not effective due to these serious obstacles. Our processing method is founded on the sevenfold e-beam direct writing and the subsequent relatively shallow (1.15 pm) RIE. E -beam exposes deep lens features easily and we had no problems when developing the exposed pattem. Poor step coverage by the resist layer is another reason for planarization hut using our method all the steps previously obtained have to be exposed in a subsequent step of lithography (steps are not covered at all during RE). E-beam resist thickness had not to be modified in a special way. We have used PMMA layer 0.35 pm thick. The problem of RIE process without "silicon grass'' was solved when we found optimal gas mixture consisting of BCI,, CF4 and 0 2 . The RF power delivered to our RIE chamber was 75W and DC bias w...