The optical properties of mono‐ and trilayer graphene on SiO2/Si substrate are studied at hydrogen Lyman‐alpha (121.6 nm) spectral line for the first time. The optical anisotropy of graphene at this wavelength is experimentally demonstrated by retrieving the anisotropic “effective” optical constants. The results confirm that the axis of symmetry is nearly perpendicular to the surface and coherently related to the π‐orbitals’ structural orientation. Furthermore, it is observed that graphene strongly affects the performances of the substrate by inducing a pseudo‐Brewster angle downshift, which depends on the number of graphene layers. This finding is in contrast with what occurs in the visible spectral range, where the upshift of the pseudo‐Brewster angle is experienced in similar samples.

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The knowledge and the manipulation of light polarization state in the vacuum ultraviolet and extreme ultraviolet (EUV) spectral regions play a crucial role from materials science analysis to optical component improvements. In this paper, we present an EUV spectroscopic ellipsometer facility for polarimetry in the 90-160 nm spectral range. A single layer aluminum mirror to be used as a quarter wave retarder has been fully characterized by deriving the optical and structural properties from the amplitude component and phase difference δ measurements. The system can be suitable to investigate the properties of thin films and optical coatings and optics in the EUV region.