A fast noninvasive method based on scattering from a focused radially polarized light to detect and localize subwavelength nanoparticles on a substrate is presented. The technique relies on polarization matching in the far field between scattered and spurious reflected fields. Results show a localization uncertainty of ≈ 10 −4 λ 2 is possible for a particle of area ≈λ 2 =16. The effect of simple pupil shaping is also shown.

Spot size reduction is demonstrated by printing focused spots from amplitude-modulated radially polarized light at the wavelength λ = 405 nm on a photoresist. Amplitude modulation is realized by ring illumination and by application of an optimized amplitude distribution function. Amplitude modulation is implemented via spatial light modulator, which is followed by a specially designed radial wire grid polarizer to obtain high-quality radially polarized light. Comparison between full and amplitude modulated apertures of the written focused spots on a photoresist is performed. Rigorous simulations based on the Richards-Wolf integral are made to confirm experimental data.

Abstract. Laser direct-writing is an important technique for the fabrication of complex patterns. There is a continuous need for structures with increasingly small features, i.e., enhanced resolution. Focused radially polarized light is known to exhibit a narrow longitudinal polarization component. Here, a proof-of-concept is shown of enhanced resolution through polarization-selectivity by the selective recording of the longitudinal polarization component in a polarization-selective homeotropic and smectic B photoresist. The full-width-at-half-maximum (FWHM) of the fabricated spots in the polarization-selective resist is up to 56% smaller compared to the FWHM of the same spot in a photoresist that is not polarization-selective, which supports simulations that predict a theoretical maximum reduction of 62%. © The Authors. Published by SPIE under a Creative Commons Attribution 3.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

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