Pure anatase TiO 2 thin films were successfully deposited on five kind of substrates including p-type silicon, AZO, ITO, glass, and quartz class substrates by mist CVD method. The deposited temperature to get the pure anatase TiO 2 thin film was optimized at 400°C. The intertwined nanosheets structure of TiO 2 thin films with uniformity were observed on all of different substrates. The deposited TiO 2 thin films on five kind of substrates could be confirmed that the pure anatase TiO 2 with the same dominant peak of ( 101) and crystallinity was significantly improved in order of ptype silicon, AZO, ITO, glass, and quartz glass substrates. The transmittance of TiO 2 films on transparent substrates showed the high transmittance of over 65% in visible region. The pure anatase TiO 2 film on AZO substrate with lowest roughness had the greater potential to apply in photocatalytic applications