In the classic transistor, the number of electric charge carriers--and thus the electrical conductivity--is precisely controlled by external voltage, providing electrical switching capability. This simple but powerful feature is essential for information processing technology, and also provides a platform for fundamental physics research. As the number of charges essentially determines the electronic phase of a condensed-matter system, transistor operation enables reversible and isothermal changes in the system's state, as successfully demonstrated in electric-field-induced ferromagnetism and superconductivity. However, this effect of the electric field is limited to a channel thickness of nanometres or less, owing to the presence of Thomas-Fermi screening. Here we show that this conventional picture does not apply to a class of materials characterized by inherent collective interactions between electrons and the crystal lattice. We prepared metal-insulator-semiconductor field-effect transistors based on vanadium dioxide--a strongly correlated material with a thermally driven, first-order metal-insulator transition well above room temperature--and found that electrostatic charging at a surface drives all the previously localized charge carriers in the bulk material into motion, leading to the emergence of a three-dimensional metallic ground state. This non-local switching of the electronic state is achieved by applying a voltage of only about one volt. In a voltage-sweep measurement, the first-order nature of the metal-insulator transition provides a non-volatile memory effect, which is operable at room temperature. Our results demonstrate a conceptually new field-effect device, extending the concept of electric-field control to macroscopic phase control.

Epitaxial oxide thin films are at the heart of new “oxide electronic” applications, such as excitonic ultraviolet light-emitting diodes and resistive switching memories. Complex oxide films are often grown by pulsed laser deposition (PLD) because the technique is believed to be material agnostic. Here, we show that one of the fundamental premises used to justify the use of PLD, that material is transferred from an ablation target to the film without stoichiometry deviations, is incorrect even when no volatile elements are involved. Even more importantly, the commonly used solution of increasing the laser energy density above a material-specific threshold value to obtain stoichiometric films cannot be used in the case of low carrier density systems such as SrTiO3, where even minute 1018 cm−3 order cation nonstoichiometry can have a dramatic effect on transport. Lattice parameter deviations in oxide films, which are often incorrectly ascribed to oxygen loss, correlate very well with cation nonstoichiometry. We show that proper simultaneous choice of ablation laser fluence and ablation area is essential and often more important than the growth temperature and oxygen pressure for obtaining bulklike properties in oxide heterostructures.

The resistive switching properties of Sr2TiO4 thin films with specific defect distribution have been studied. Junctions of Sr2TiO4 thin films containing a high density of defects show well‐pronounced resistive switching properties while those with well‐ordered microstructure exhibited insignificant hysteresis windows. This work clearly demonstrates the crucial role of defects for the microscopic switching mechanisms in oxide thin films.

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