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Abstract— A high‐performance inorganic electroluminescence (EL) device has been successfully developed by using an EL structure with a thick dielectric layer (TDEL) and sputtered BaAl2S4:Eu blue phosphor. The luminance and efficacy were higher than 2300 cd/m2 and 2.5 lm/W at L60, 120 Hz, respectively. Furthermore, the luminance at L60, 1.2 kHz was more than 23,000 cd/m2. The phosphor layer has a single‐phase and a highly oriented crystalline structure. The phosphor also shows high stability in air. A 34‐in. high‐definition television (HDTV) has been developed by combining a TDEL structure and color‐conversion materials. The panels with an optimized color filter demonstrated a peak luminance of 350 cd/m2, a color gamut of more than 100% NTSC, and a wide viewing angle similar to that of plasma‐display panels. The high reproducibility of the 34‐in. panels using our pilot line has been confirmed.

A new type lenticular lens screen has developed. It realizes both high contrast and fine lenticular lens pitch that prevent appearing a moiré between lenticular lens and pixel of projector. It use a new principal to enhance contrast, which is an application of the difference between light pass of image light and that of ambient light.

Half-tone phase shift masks with Cr-based shifters have been developed for i-line lithography. The printability of defects is determined with test masks for the four categories of defects: clear defects (pinholes and intrusions) and opaque defects (pinspots and extrusions) under the conditions that a normal hole of 0.40p.m width is formed by an i-line stepper with NA = 0.57. The detectability with a KLA219HRL-PS and that of a KLA33 1 are also evaluated. The minimum detectable defect size is found to be smaller than the minimum intolerable defect size for each category. Clear defects are repairable by covering them with carbon patches deposited by a focused-ion-beam repair system. On the basis of the consideration of both the shielding effect and the halo effect of the patch, the deposition conditions are optimized: the thickness is 150 nm and the patch edge should be placed just on the hole edge. Opaque defects are repairable by removing them with a laser repair system without any printable damage. A KLA219HRL-PS is used for inspection both before repair and before shipment. It is confirmed that the well repaired (i.e., unprintable) defects are undetectable. Quality assurance tools are summarized. O-8194-1563-4/94/$6.OO SPIE Vol. 2254 Photomask and X-Ray Mask Technology (1994) / 261 Downloaded From: http://proceedings.spiedigitallibrary.org/ on 06/16/2016 Terms of Use: http://spiedigitallibrary.org/ss/TermsOfUse.aspx