ABSTRACT:Polyhedral oligomeric silsesquioxane (POSS)-terminated polystyrene (PS-POSS) was prepared by nitroxide-mediated radical polymerization of styrene with POSS-containing initiator, and the thermal stability of PS-POSS thin films was investigated. Rheological measurement of PS-POSS revealed that the rheological properties were profoundly affected by the presence of POSS end groups in low molecular weight region (M n % 2000), while those were nearly unaffected in high molecular weight region (M n %
A polyhedral oligomeric silsesquioxane (POSS)-containing initiator for nitroxide-mediated radical polymerization was synthesized to prepare organic–inorganic hybrid polymers (PS-POSS), which are polystyrene (PS) with a POSS end group. PS-POSS were well dispersed in PS thin films and provided thermal stability to films against dewetting.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.