The microSVUctures of a?-deposited CO-Ag nano-granular films are characterized by x-ray diffraction, transmission electron microscopy and high-resolution electron microscopy. In as-deposited films, there is a strong tendency for phase separation to occur; Co and Ag particles coexist m the films. The average size of CO grains varies with the CO concentration. Ag particles have the preferential lattice orientation (110) and Co particles have lanice orientations (110). ( 111). (LIZ), and (100) in the direction of the film surface normal. There is a tendency for two connecting grains to have two groups of parallel lauice planes.

Microstructures and characteristics of nano-size hydrogenated crystalline silicon films (nc-Si:H) have been studied by high-resolution electron microscopy (HREM), X-ray diffraction patterns and Raman spectroscopy. The microcrystalline grains in nc-Si:H films are about 3-5 nm in size and are separated by different characteristic boundaries. The volume fraction of the crystalline component is about 46%. Microdefects in nanocrystalline grains were also found. The electrical conductivities of the films were found by measurement to be about 10-3-10-2 ( Omega cm)-1. Analysis of the experimental results shows that the nano-size hydrogenated crystalline silicon films are in good agreement with the international definition of nanocrystalline material.