Toluene removal is investigated in filamentary plasmas produced in N 2 and in N 2 /O 2 mixtures by a pulse high voltage energised DBD. Influence of the oxygen percentage (lower than 10%) and of the temperature (lower than 350°C) is examined. Toluene is removed in N 2 through collisions with electrons and nitrogen excited states. The removal efficiency is a few higher in N 2 /O 2 . It increases when the temperature increases for N 2 and N 2 /O 2 . Both H-and O-atoms play an important role in toluene removal because H can readily recombine with O to form OH, which is much more reactive with toluene than O. H follows from dissociation of toluene and of hydrogenated by-products by electron collisions. Detection of cyanhidric acid, acetylene, formaldehyde, and methyl nitrate strengthens that dissociation processes, to produce H and CH 3 , must be taken into account in kinetic analysis. Formation and treatment of deposits are also analysed.

This work is devoted to the study of atomic oxygen recombination on a glass surface, mainly in connection with atomic sources development. In this paper we present a non-stationary model for atomic oxygen recombination on a fused silica surface. Kinetics equations for oxygen atoms, taking into account heterogeneous reactions between gaseous atoms and the surface (Eley-Rideal mechanisms), as well as homogeneous processes involving surface migration of adsorbed species (Langmuir-Hinshelwood mechanisms), are solved. Surface reaction coefficients are calculated, and the choice of numerical values for surface parameters is discussed. The solution to the equations is compared to our previous experiments concerning the influence of the surface state on atomic recombination. An estimation is made of surface reaction coefficient values.