Upon submonolayer deposition of silicon onto the anisotropic silver (110) surface flat lying individual Si nanowires, all oriented along the [−110] direction, can be grown at room temperature with a high aspect ratio. Upon deposition at ∼200°C, these one-dimensional nanostructures self-assemble by lateral compaction to form a regular array of essentially identical nanowires, ∼1.6nm in width, covering uniformly the entire substrate surface. They realize, at macroscopic sizes, a highly perfect one-dimensional grating with a molecular-scale pitch of just 2nm.
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