Nanocrystalline diamond (NCD) has attracted much attention
in recent
years because of improvements in growth methodologies that have provided
increases in both film thickness and growth rate, while preserving
the outstanding mechanical properties of diamond material. We provide
here some evidence, based on combined experimental and first-principles
analyses, that ultralow friction of nanocrystalline diamond in the
presence of water vapor is associated with OH and H passivation of
sliding surfaces, resulting from the dissociative adsorption of H2O molecules. The presence of these adsorbates (OH and H fragments)
keeps the surfaces far apart preventing the formation of covalent
bonds across the interface. H-passivated surfaces, resulting from
the dissociative adsorption of H2 molecules, appears to
be more efficient in further reducing friction than OH-terminated
surfaces.
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