Patterned growth of freestanding carbon nanotube͑s͒ on submicron nickel dot͑s͒ on silicon has been achieved by plasma-enhanced-hot-filament-chemical-vapor deposition ͑PE-HF-CVD͒. A thin film nickel grid was fabricated on a silicon wafer by standard microlithographic techniques, and the PE-HF-CVD was done using acetylene (C 2 H 2 ) gas as the carbon source and ammonia (NH 3 ) as a catalyst and dilution gas. Well separated, single carbon nanotubes were observed to grow on the grid. The structures had rounded base diameters of approximately 150 nm, heights ranging from 0.1 to 5 m, and sharp pointed tips. Transmission electron microscopy cross-sectional image clearly showed that the structures are indeed hollow nanotubes. The diameter and height depend on the nickel dot size and growth time, respectively. This nanotube growth process is compatible with silicon integrated circuit processing. Using this method, devices requiring freestanding vertical carbon nanotube͑s͒ such as scanning probe microscopy, field emission flat panel displays, etc. can be fabricated without difficulty.

The Stark splitting of a single fourfold degenerate impurity located within the built-in potential of a metal-semiconductor contact is investigated using low temperature transport measurements. A model is developed and used to analyze transport as a function of temperature, bias voltage, and magnetic field. Our data is consistent with a boron impurity. We report g factors of g_{1/2}=1.14 and g_{3/2}=1.72 and a linear Stark splitting 2Delta of 0.1 meV.

Microstructures of well-aligned multiwall carbon nanotubes grown on patterned nickel nanodots and uniform thin films by plasma-enhanced chemical vapor deposition have been studied by electron microscopy. It was found that growth of carbon nanotubes on patterned nickel nanodots and uniform thin films is different. During growth of carbon nanotubes, a nickel particle sits at the tip of each nanotube, and its [220] is preferentially oriented along the plasma direction, which can be explained by a channeling effect of ions coming into nickel particles in plasma. The alignment of nanotubes is induced by the electrical field direction relative to substrate surface.