ZrO2-SiO2 and Nb2O5-SiO2 mixture coatings as well as those of pure zirconia (ZrO2), niobia (Nb2O5), and silica (SiO2) deposited by ion-beam sputtering were investigated. Refractive-index dispersions, bandgaps, and volumetric fractions of materials in mixed coatings were analyzed from spectrophotometric data. Optical scattering, surface roughness, nanostructure, and optical resistance were also studied. Zirconia-silica mixtures experience the transition from crystalline to amorphous phase by increasing the content of SiO2. This also results in reduced surface roughness. All niobia and silica coatings and their mixtures were amorphous. The obtained laser-induced damage thresholds in the subpicosecond range also correlates with respect to the silica content in both zirconia- and niobia-silica mixtures.

A principal possibility to overcome fundamental (intrinsic) limit of pure optical materials laser light resistance is investigated by designing artificial materials with desired optical properties. We explore the suitability of high band-gap ultra-low refractive index material (n less than 1.38 at 550 nm) in the context of highly reflective coatings with enhanced optical resistance. The new generation all-silica (porous/nonporous) SiO2 thin film mirror with 99% reflectivity was prepared by glancing angle deposition (GLAD). Its damage performance was directly compared with state of the art hafnia/silica coating produced by Ion-Beam-Sputtering. Laser-Induced Damage Thresholds (LIDT) of both coatings were measured in nanosecond regime at 355 nm wavelength. Novel approach indicates the potential for coating to withstand laser fluence of at least 65 J/cm2 without reaching intrinsic threshold value. Reported concept can be expanded to virtually any design thus opening a new way of next generation thin film production well suited for high power laser applications.

A system for measurement of surface roughness based on total integrated scattering at 532 and 355 nm is built and demonstrated. Surfaces up to 25 mm × 25 mm are scanned in 6 min with a spatial resolution of 0.4 mm. Careful attention to reducing stray light and purging the measurement chamber with filtered air allow scattering resolution better than 10−5. Surface roughness measurements better than 1 nm RMS are demonstrated and confirmed by comparison measurements with an atomic-force microscope.

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